SOI wafer尺寸:4”(100mm), 5”(125mm), 6”(150mm) and? 8"(200mm)
SOI Spec. 规格:
???? 1-??? Bonded SOI?wafer (绝缘硅上键合硅片)
????????????????????????? For 4”(100mm), 5”(125mm), 6”(150mm)
?????????????????????---- Handle wafer?minimum 300um maximum 1000um,
?????????????????????---- Buried Oxide, minimum 0.1 um, maximum 4 um,
???????????????????? ----?Device layer minimum 2 um, max 500 um.
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??????????????????????????For 8"(200mm)
?????????????????????----?Handle thickness minimum 500um and maximum 675um,
?????????????????????----?Buried Oxide minimum 0.1 um, maximum 4 um,
?????????????????????----?Device layer minimum 5 um, maximum 500 um.
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2-???????Si-Si direct wafer bonding (replacement for epi) 硅-硅直接键合,可替代外延片
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????? 100mm, 125mm, 150mm and 200mm, thickness as specified above.
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3-???????Engineered SOI, Double SOI (DSOI), Trench Isolation SOI (dielectric isolation),
????? Cavity SOI (for pressure sensor, gyro and accelerometer sensor, microfludic etc.)
???? ?and finally Through Silicon Via (TSV)???
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?----? Cavity SOI - Bonded SOI or Silicon silicon DWB wafers with cavities performed within the wafer
?---- Multiple SOI 2 or 3 or more layers of SOI designed around your process
?---- Structured wafers silicon wafers or SOI with buried electrode layers, vias, interconnect already incorporated
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???? 4-?????SOI +?Trench & Refill
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???Features
Significant die shrink compared to conventional dielectric isolation
???? (DI) or junction isolation
Bulk quality top silicon layer Total device-to-device isolation Lower substrate capacitance than bulk Fully flexible specification on SOI, Trench and refill parameters